Advances in full field microscopy with table-top soft x-ray lasers

Carmen S. Menoni; Fernando Brizuela; Yong Wang; Courtney A. Brewer; Bradley M. Luther; Francesco Pedaci; Przemeslaw W. Wachulak; Mario C. Marconi; Jorge J. Rocca; Weilun Chao; Erik H. Anderson; Yanwei Liu; Kenneth A. Goldberg; David T. Attwood; Alexander V. Vinogradov; Igor A. Artyukov; Yuri P. Pershyn; Viktor Kondratenko

doi:10.1117/12.826419

28 September 2009 Advances in full field microscopy with table-top soft x-ray lasers

Carmen S. Menoni, Fernando Brizuela, Yong Wang, Courtney A. Brewer, Bradley M. Luther, Francesco Pedaci, Przemeslaw W. Wachulak, Mario C. Marconi, Jorge J. Rocca, Weilun Chao, Erik H. Anderson, Yanwei Liu, Kenneth A. Goldberg, David T. Attwood, Alexander V. Vinogradov, Igor A. Artyukov, Yuri P. Pershyn, Viktor Kondratenko

Author Affiliations +

Proceedings Volume 7451, Soft X-Ray Lasers and Applications VIII; 74510I (2009) https://doi.org/10.1117/12.826419
Event: SPIE Optical Engineering + Applications, 2009, San Diego, California, United States

Abstract

We describe recent advances in the demonstration of table-top full field microscopes that use soft x-ray lasers for illumination. We have achieved wavelength resolution and single shot exposure operation with a very compact 46.9 nm microscope based on a desk-top size capillary discharge laser. This λ=46.9 nm microscope has been used to captured full field images of a variety of nanostructure systems and surfaces. In a separate development we have demonstrated a zone plate microscope that uses λ=13.2 nm laser illumination to image absorption defects in a extreme ultraviolet lithography (EUVL) mask in the same geometry used in a 4x demagnification EUVL stepper. Characterization of the microscope's transfer function shows it can resolve 55 nm half period patterns. With these capabilities, the λ=13.2 nm microscope is well suited for evaluation of pattern and defect printability of EUVL masks for the 22 nm node.

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Carmen S. Menoni, Fernando Brizuela, Yong Wang, Courtney A. Brewer, Bradley M. Luther, Francesco Pedaci, Przemeslaw W. Wachulak, Mario C. Marconi, Jorge J. Rocca, Weilun Chao, Erik H. Anderson, Yanwei Liu, Kenneth A. Goldberg, David T. Attwood, Alexander V. Vinogradov, Igor A. Artyukov, Yuri P. Pershyn, and Viktor Kondratenko "Advances in full field microscopy with table-top soft x-ray lasers", Proc. SPIE 7451, Soft X-Ray Lasers and Applications VIII, 74510I (28 September 2009); https://doi.org/10.1117/12.826419

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