Paper
3 December 2009 Reflectance difference laser measurements applied to the study of the stress/strain state in materials
Carlos H. Saucedo-Zárate, Maximo López-López, Carlos Sánchez-López, Jose Luis Correa-Figueroa, Jorge A. Huerta-Ruelas
Author Affiliations +
Proceedings Volume 7499, Seventh Symposium Optics in Industry; 74990U (2009) https://doi.org/10.1117/12.849043
Event: Seventh Symposium on Optics in Industry, 2009, Guadalajara, Jalisco, Mexico
Abstract
Development of experimental setup to study strain/stress state in materials emerges from a need to evaluate by a nondestructive and non-invasive technique the performance in new materials like semiconductor heterostructures, composite materials and alloys. The system was designed and built to be used as a multi-functional experimental setup. The main purpose is to characterize materials in elastic and plastic regime by reflectance difference laser measurements and strain gages. This system allows the generalization of results obtained from a theoretical model based in Finite Element Model and experimental measurements taken in finite specific points with strain gages. A NI™ platform is used for signal conditioning and processing. System built is described which includes an optical setup to measure reflectance difference laser (RDL), and a flexor which applies deformation in a link, with a micrometer. A correlation bigger than 0.95 was found between optical signal, strain gage signal, and finite element modeling.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Carlos H. Saucedo-Zárate, Maximo López-López, Carlos Sánchez-López, Jose Luis Correa-Figueroa, and Jorge A. Huerta-Ruelas "Reflectance difference laser measurements applied to the study of the stress/strain state in materials", Proc. SPIE 7499, Seventh Symposium Optics in Industry, 74990U (3 December 2009); https://doi.org/10.1117/12.849043
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Reflectivity

Finite element methods

Semiconductors

Signal processing

Optical testing

Data acquisition

Heterojunctions

RELATED CONTENT

Optical Linewidth Measurements On Wafers
Proceedings of SPIE (September 06 1978)
Focus and dose control to actual process wafer
Proceedings of SPIE (March 22 2008)
Closed-loop design of a semiconductor laser
Proceedings of SPIE (February 09 2007)
Focus and dose control for high volume manufacturing
Proceedings of SPIE (December 04 2008)

Back to Top