Paper
28 December 2010 Comparison of three TCC calculation algorithms for partially coherent imaging simulation
Xiaofei Wu, Shiyuan Liu, Wei Liu, Tingting Zhou, Lijuan Wang
Author Affiliations +
Proceedings Volume 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation; 75440Z (2010) https://doi.org/10.1117/12.885227
Event: Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 2010, Hangzhou, China
Abstract
Three kinds of TCC (transmission cross coefficient) calculation algorithms used for partially coherent imaging simulation, including the integration algorithm, the analytical algorithm, and the matrix-based fast algorithm, are reviewed for their rigorous formulations and numerical implementations. The accuracy and speed achievable using these algorithms are compared by simulations conducted on several mainstream illumination sources commonly used in current lithographic tools. Simulation results demonstrate that the integration algorithm is quite accurate but time consuming, while the matrix-based fast algorithm is efficient but its accuracy is heavily dependent on simulation resolution. The analytical algorithm is both efficient and accurate but not suitable for arbitrary optical systems. It is therefore concluded that each TCC calculation algorithm has its pros and cons with a compromise necessary to achieve a balance between accuracy and speed. The observations are useful in fast lithographic simulation for aerial image modeling, optical proximity correction (OPC), source mask optimization (SMO), and critical dimension (CD) prediction.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaofei Wu, Shiyuan Liu, Wei Liu, Tingting Zhou, and Lijuan Wang "Comparison of three TCC calculation algorithms for partially coherent imaging simulation", Proc. SPIE 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 75440Z (28 December 2010); https://doi.org/10.1117/12.885227
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Cited by 3 scholarly publications and 1 patent.
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KEYWORDS
Computer simulations

Fourier transforms

Lithography

Coherence imaging

Lithographic illumination

Imaging systems

Photomasks

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