Study on the homogeneity of fused silica blanks for lithography objective

Zhiyuan Liao; Tingwen Xing; Hongwei Zhu

doi:10.1117/12.866846

12 October 2010 Study on the homogeneity of fused silica blanks for lithography objective

Zhiyuan Liao, Tingwen Xing, Hongwei Zhu

Proceedings Volume 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 76564F (2010) https://doi.org/10.1117/12.866846
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

With the development of the lithography technologies to create smaller features with higher NA, lower k1 values and shorter wavelengths, homogeneity specifications for fused silica blanks continue to tighten³. Fused silica and calcium fluoride are the only material for the DUV lithography objective. One of the difficult problems for the lithography is how to deal with the capability of the optical material. The inhomogeneity will influence the quality of lithography objective and is an important specification. In order to obtain relative homogeneity specifications for each fused silica blanks of the overall lithography objective, we can iterate the lenses of the lithography objective in turn, one piece lens at a time, which the iterated one has the same spherical gradient index, we can obtain the RMS wavefront errors of all fields after every iterativeness. When all iterativeness is implemented, we can find the difference between design and results of iterativeness. The degradation of the RMS wavefront errors is larger; the lens iterated is more sensitive for index. According to the RMS wavefront errors of iterative results, we can make a conclusion that homogeneity specification for fused silica blanks of the lithography lens is extraordinarily different, not all lens need the same homogeneity specifications. It is known, higher homogeneity, more expensive. So we can choose the different homogeneity grade fused silica blanks.

Citation Download Citation

Zhiyuan Liao, Tingwen Xing, and Hongwei Zhu "Study on the homogeneity of fused silica blanks for lithography objective", Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 76564F (12 October 2010); https://doi.org/10.1117/12.866846

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KEYWORDS

Lithography

Silica

Objectives

Lenses

Wavefronts

Refractive index

Spherical lenses

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