Research on the distribution of electric field intensity and laser damage characteristics of thin films

Yuan Li; Jun-qi Xu; Jun-hong Su

doi:10.1117/12.865738

12 October 2010 Research on the distribution of electric field intensity and laser damage characteristics of thin films

Yuan Li, Jun-qi Xu, Jun-hong Su

Author Affiliations +

Proceedings Volume 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 76564L (2010) https://doi.org/10.1117/12.865738
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

With the development of high power laser technology, laser protection attracts more and more domestic and external researchers' attention. The study on how to increase the laser induce damage threshold (LIDT) of optical films, which is very important, is a breakthrough to improve the capability of laser systems. In the paper, the distribution of electric field intensity and laser damage characteristics of optical films was researched. The electric field distribution with different thickness films were simulated by program. The electric field distribution in the film was calculated by design software (TFCalc). Laser films were prepared by electron beam evaporation technology. The 1064 nm laser was used to investigate laser damage properties of laser films. It was found that the distribution of electric field intensity within film has an obvious influence on the films' anti-laser damage capability. To MgF₂ single-layer film, the smaller field intensity distribution on the thin films' air-film surface contributes to the ability of thin-film laser anti-damage. If the thin films' structure system was designed properly and the parameters selected properly, the higher LIDT films could be obtained, then the capability of optical system can be improved.

Citation Download Citation

Yuan Li, Jun-qi Xu, and Jun-hong Su "Research on the distribution of electric field intensity and laser damage characteristics of thin films", Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 76564L (12 October 2010); https://doi.org/10.1117/12.865738

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
5 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Laser induced damage

Thin films

Magnesium fluoride

Laser applications

Electron beams

High power lasers

Laser damage threshold

Show All Keywords

Keywords/Phrases

Search In:

Publication Years