Level set method for microfabrication simulations

Maciej Baranski; Rafal Kasztelanic; Jorge Albero; Lukasz Nieradko; Christophe Gorecki

doi:10.1117/12.853836

13 May 2010 Level set method for microfabrication simulations

Maciej Baranski, Rafal Kasztelanic, Jorge Albero, Lukasz Nieradko, Christophe Gorecki

Proceedings Volume 7716, Micro-Optics 2010; 77161W (2010) https://doi.org/10.1117/12.853836
Event: SPIE Photonics Europe, 2010, Brussels, Belgium

Abstract

The article describes application of Level Set method for two different microfabrication processes. First is shape evolution of during reflow of the glass structure. Investigated problem were approximated by viscous flow of material thus kinetics of the process were known from physical model. Second problem is isotropic wet etching of silicon. Which is much more complicated because dynamics of the shape evolution is strongly coupled with time and geometry shapes history. In etching simulations Level Set method is coupled with Finite Element Method (FEM) that is used for calculation of etching acid concentration that determine geometry evolution of the structure. The problem arising from working with FEM with time varying boundaries was solved with the use of the dynamic mesh technique employing the Level Set formalism of higher dimensional function for geometry description. Isotropic etching was investigated in context of mico-lenses fabrication. Model was compared with experimental data obtained in etching of the silicon moulds used for micro-lenses fabrication.

Citation Download Citation

Maciej Baranski, Rafal Kasztelanic, Jorge Albero, Lukasz Nieradko, and Christophe Gorecki "Level set method for microfabrication simulations", Proc. SPIE 7716, Micro-Optics 2010, 77161W (13 May 2010); https://doi.org/10.1117/12.853836

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