Low-reflective wire-grid polarizers with absorptive interference overlayers

Motofumi Suzuki; Akio Takada; Takatoshi Yamada; Takashi Hayasaka; Kouji Sasaki; Eiji Takahashi; Seiji Kumagai

doi:10.1117/12.858454

23 August 2010 Low-reflective wire-grid polarizers with absorptive interference overlayers

Motofumi Suzuki, Akio Takada, Takatoshi Yamada, Takashi Hayasaka, Kouji Sasaki, Eiji Takahashi, Seiji Kumagai

Proceedings Volume 7766, Nanostructured Thin Films III; 776609 (2010) https://doi.org/10.1117/12.858454
Event: SPIE NanoScience + Engineering, 2010, San Diego, California, United States

Abstract

We theoretically propose two types of antireflection (AR) coatings for metals. One type consists of a single layer of a dielectric material having a high refractive index. The other type consists of bilayers of absorptive and dielectric materials that are used in order to reduce the reflectance of high reflectivity metals such as Al in the visible region. The bilayered AR concept has been applied to reduce the reflectance of wire grid (WG) polarizers made of Al. An FeSi2 layer, which serves as an absorptive layer, has been deposited by the glancing angle deposition technique immediately on the top of Al wires covered with a thin SiO2 layer, which serves as a gap layer. For the optimum combination of the thicknesses of FeSi2 and SiO2, the reflectance reduces to lower than a few percent independent of the polarization, whereas the transmission polarization properties remain favorable. Because low reflectivity WG polarizers are completely composed of inorganic materials, they are useful for applications requiring thermal durability, such as liquid crystal projection displays.

Citation Download Citation

Motofumi Suzuki, Akio Takada, Takatoshi Yamada, Takashi Hayasaka, Kouji Sasaki, Eiji Takahashi, and Seiji Kumagai "Low-reflective wire-grid polarizers with absorptive interference overlayers", Proc. SPIE 7766, Nanostructured Thin Films III, 776609 (23 August 2010); https://doi.org/10.1117/12.858454

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