Pulsed laser deposition of nanostructured indium-tin-oxide film

Thian Kok Yong; Chen Hon Nee; Seong Shan Yap; Wee Ong Siew; György Sáfran; Yoke Kin Yap; Teck Yong Tou

doi:10.1117/12.869561

23 August 2010 Pulsed laser deposition of nanostructured indium-tin-oxide film

Thian Kok Yong, Chen Hon Nee, Seong Shan Yap, Wee Ong Siew, György Sáfran, Yoke Kin Yap, Teck Yong Tou

Proceedings Volume 7766, Nanostructured Thin Films III; 776615 (2010) https://doi.org/10.1117/12.869561
Event: SPIE NanoScience + Engineering, 2010, San Diego, California, United States

Abstract

Effects of O₂, N₂, Ar and He on the formation of micro- and nanostructured indium tin oxide (ITO) thin films were investigated in pulsed Nd:YAG laser deposition on glass substrate. For O₂ and Ar, ITO resistivity of ≤ 4 × 10^-4 Ωcm and optical transmittance of > 90% were obtained with substrate temperature of 250 °C. For N₂ and He, low ITO resisitivity could be obtained but with poor optical transmittance. SEM images show nano-structured ITO thin films for all gases, where dense, larger and highly oriented, microcrystalline structures were obtained for deposition in O₂ and He, as revealed from the XRD lines. EDX results indicated the inclusion of Ar and N₂ at the expense of reduced tin (Sn) content. When the ITO films were applied for fabrication of organic light emitting devices (OLED), only those deposited in Ar and O₂ produced comparable performance to single-layer OLED fabricated on the commercial ITO.

Citation Download Citation

Thian Kok Yong, Chen Hon Nee, Seong Shan Yap, Wee Ong Siew, György Sáfran, Yoke Kin Yap, and Teck Yong Tou "Pulsed laser deposition of nanostructured indium-tin-oxide film", Proc. SPIE 7766, Nanostructured Thin Films III, 776615 (23 August 2010); https://doi.org/10.1117/12.869561

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