Paper
2 August 2010 Design, technology, and signal processing for DOE-based microinterferometer array applied in new generation M(O)EMS test equipment
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Abstract
The paper introduces different approaches to overcome the large ratio between wafer size and feature size in micro production. The EU-project SMARTIEHS develops a new concept for high volume M(O)EMS testing. The design of the test station is presented and the advancements compared to the state of the art are introduced within the following fields: micro-optical laser interferometer (LI) design, DOE-based microinterferometer production, smart-pixel camera and signal processing for resonance frequency and vibration amplitude distribution determination. The first experiments performed at LI demonstrator are also reported.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Kujawinska, M. Józwik, A. Styk, U. Zeitner, A. Røyset, S. Beer, R. Moosburger, C. Gorecki, and K. Gastinger "Design, technology, and signal processing for DOE-based microinterferometer array applied in new generation M(O)EMS test equipment", Proc. SPIE 7791, Interferometry XV: Applications, 779103 (2 August 2010); https://doi.org/10.1117/12.862170
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Interferometers

Semiconducting wafers

Cameras

Lithium

Imaging systems

Inspection

Diffraction gratings

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