Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

Yinbing Bai; A. Ping Zhang

doi:10.1117/12.888450

3 January 2011 Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

Yinbing Bai, A. Ping Zhang

Proceedings Volume 7990, Optical Sensors and Biophotonics II; 799006 (2011) https://doi.org/10.1117/12.888450
Event: Asia Communications and Photonics Conference and Exhibition, 2010, Shanghai, Shanghai, China

Abstract

We present some novel periodic structures with different internal nanopatterns based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures are fabricated with precisely control of exposure directions and doses as well as the total number of exposures. Experimental fabrication of microstructures are demonstrated and comparied with numerical simulations of intensity distributions. The size of the fabricated samples is around 1 square centimeter. The diffraction spectra of the fabricated samples are measured and tested. The experiment results show such a fabrication technology is very promising for making diverse large-area microstructures with complex internal nanopatterns.

Citation Download Citation

Yinbing Bai and A. Ping Zhang "Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography", Proc. SPIE 7990, Optical Sensors and Biophotonics II, 799006 (3 January 2011); https://doi.org/10.1117/12.888450

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