New Approaches For High Repeatibility Mask Making And Mask Measuring

Hans-Dieter Jacoby

doi:10.1117/12.954847

20 September 1976 New Approaches For High Repeatibility Mask Making And Mask Measuring

Hans-Dieter Jacoby

Proceedings Volume 0080, Developments in Semiconductor Microlithography; (1976) https://doi.org/10.1117/12.954847
Event: Developments in Semiconductor Microlithography, 1976, San Jose, CA, United States

Abstract

A step repeater and a mask measuring machine have been designed and tested. One of the important goals of the development for both machines was realising small repeatibility errors. For this purpose special principles in measuring techniques,in positioning systems and in design principles have been adheared which are being described, together with the concept of computer controll. For the measuring machine a newly developed two-coordinate photoelectric-microscope is being used as pick up. Repeatibility errors are for the step repeater 0,1 μm measured on different mask plates, and for the mask measuring machine o,o8 μm, 1 sigma value.

Citation Download Citation

Hans-Dieter Jacoby "New Approaches For High Repeatibility Mask Making And Mask Measuring", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954847

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