Obtaining A Mask Set - From A Users Point Of View

Jamie Van De Ven

doi:10.1117/12.954851

20 September 1976 Obtaining A Mask Set - From A Users Point Of View

Jamie Van De Ven

Proceedings Volume 0080, Developments in Semiconductor Microlithography; (1976) https://doi.org/10.1117/12.954851
Event: Developments in Semiconductor Microlithography, 1976, San Jose, CA, United States

Abstract

Variables are listed that must be considered and included in mask inspection specification when a mask set is obtained from a mask maker. There is nothing more discouraging and abstract than obtaining a mask set from a mask maker to a certain criteria. Put yourself in the mask users shoes. You thought you had written a thorough and concise mask specification. Careful consideration was given to the requirements that would insure good die yield. Attention was paid to the masking processes in use to fabricate your device. Considerations were made for type of resist, exposure equipment, develop and etch techniques and other process variables which will affect the geometries which are transferred from mask to wafer. Then the mask maker informs you of what is actually achievable on fabricated plates and the compromises begin.

Citation Download Citation

Jamie Van De Ven "Obtaining A Mask Set - From A Users Point Of View", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954851

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