Characterization of palladium thin film deposited by pulsed laser deposition

Udaibir Singh; Nisha Jha; Avinashi Kapoor

doi:10.1117/12.890863

26 July 2011 Characterization of palladium thin film deposited by pulsed laser deposition

Udaibir Singh, Nisha Jha, Avinashi Kapoor

Author Affiliations +

Proceedings Volume 8001, International Conference on Applications of Optics and Photonics; 80010W (2011) https://doi.org/10.1117/12.890863
Event: International Conference on Applications of Optics and Photonics, 2011, Braga, Portugal

Abstract

In this paper the crystalline and morphological properties of Pd thin films deposited on glass substrate by pulsed laser deposition (PLD) technique at different substrate temperatures have been investigated. These films were deposited with an excimer (XeCl) laser source (λ= 308 nm, pulse duration of 30 ns, repetition rate of 10 Hz).The fabricated films were characterized by various methods such as X-ray diffraction (XRD) and atomic force microscopy (AFM). The thickness and refractive index of samples were measured using ellipsometry. There was influence of substrate temperature on the surface roughness of thin film. The rms roughness increases with increasing temperature. As the temperature increase the crystallinity of the film also increases.

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Udaibir Singh, Nisha Jha, and Avinashi Kapoor "Characterization of palladium thin film deposited by pulsed laser deposition", Proc. SPIE 8001, International Conference on Applications of Optics and Photonics, 80010W (26 July 2011); https://doi.org/10.1117/12.890863

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