Quantitative Characterization Of Rough Si02 Surfaces By Infrared Ellipsometry

Soe-Mie F. Nee; H. E. Bennett

doi:10.1117/12.978545

1 January 1987 Quantitative Characterization Of Rough Si02 Surfaces By Infrared Ellipsometry

Soe-Mie F. Nee, H. E. Bennett

Proceedings Volume 0818, Current Developments in Optical Engineering II; (1987) https://doi.org/10.1117/12.978545
Event: 31st Annual Technical Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, San Diego, CA, United States

Abstract

The roughness and texture of rough fused-silica surfaces can be characterized by an infrared ellipsometer operating at 5-μm wavelength and at multiple angles of incidence. Anisotropy of the rough surface layer is included in the ellipsometric calculation based on the effective medium theory. The standard deviation of the measured points differs from the theoretical predictions by only two time the precision of the instrument (±0.01) deg in polarizer, analyzer, and angle of incidence). The effective thickness deduced by ellipsometry agrees with the average rms roughness measured by a stylus profilometer. The depolarization factor deduced by ellipsometry can distinguish the textures of the rough surfaces, and it agrees with the average height-to-half-width ratio of voids by stylus profilometry.

Citation Download Citation

Soe-Mie F. Nee and H. E. Bennett "Quantitative Characterization Of Rough Si02 Surfaces By Infrared Ellipsometry", Proc. SPIE 0818, Current Developments in Optical Engineering II, (1 January 1987); https://doi.org/10.1117/12.978545

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