Paper
5 December 2011 Impact of the pattern layout on the performance of photonic crystal Fano broadband reflectors
Zhiyong Chen, Zexuan Qiang, Xiaofu Xu, Junzhen Jiang, Xiyao Chen, Yishen Qiu
Author Affiliations +
Proceedings Volume 8198, 2011 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration; 819806 (2011) https://doi.org/10.1117/12.903954
Event: International Conference on Optical Instruments and Technology (OIT2011), 2011, Beijing, Beijing, China
Abstract
We report the impact of the pattern layout on the performance of Fano broadband reflectors based on 2D photonic crystals (PCs) on silicon-on-insulator. Two representative PC patterns including hexagonal and square are fairly compared with same buried oxide (BOX) layer thickness and equivalent refractive index of silicon layer by using 3D FDTD technique. Both red- and blue- spectral shifts are demonstrated with either addition of oxide on top, and/or selective etching of the BOX below. The hexagonal pattern can offer larger bandwidth with a bit lower reflectance as compared to square one. Additionally, it is more sensitive to etching thickness.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhiyong Chen, Zexuan Qiang, Xiaofu Xu, Junzhen Jiang, Xiyao Chen, and Yishen Qiu "Impact of the pattern layout on the performance of photonic crystal Fano broadband reflectors", Proc. SPIE 8198, 2011 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration, 819806 (5 December 2011); https://doi.org/10.1117/12.903954
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KEYWORDS
Silicon

Etching

Photonic crystals

Reflectors

Oxides

Finite-difference time-domain method

Refractive index

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