Submicrometer pattern generation by diffractive mask-aligner lithography

Uwe D. Zeitner; Lorenz Stuerzebecher; Torsten Harzendorf; Frank Fuchs; Dirk Michaelis

doi:10.1117/12.909806

14 February 2012 Submicrometer pattern generation by diffractive mask-aligner lithography

Uwe D. Zeitner, Lorenz Stuerzebecher, Torsten Harzendorf, Frank Fuchs, Dirk Michaelis

Proceedings Volume 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V; 82490Q (2012) https://doi.org/10.1117/12.909806
Event: SPIE MOEMS-MEMS, 2012, San Francisco, California, United States

Abstract

A novel technique for the fabrication of high resolution sub-micrometer patterns by diffractive proximity lithography in a mask-aligner is presented. The technique is based on the use of specially designed diffractive photo-masks. It requires some small modifications of the mask-aligner, especially for the mask illumination and the settings of the proximity gap between mask and substrate. The huge potential of this novel technique is demonstrated at the example of structures having lateral feature sizes in the sub-500nm range printed with mask-to-substrate distances of several ten micrometers.

Citation Download Citation

Uwe D. Zeitner, Lorenz Stuerzebecher, Torsten Harzendorf, Frank Fuchs, and Dirk Michaelis "Submicrometer pattern generation by diffractive mask-aligner lithography", Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82490Q (14 February 2012); https://doi.org/10.1117/12.909806

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