Laser-produced plasma UTA emission in 3-7nm spectral region

Takeshi Higashiguchi; Takamitsu Otsuka; Noboru Yugami; Weihua Jiang; Akira Endo; Bowen Li; Colm O'Gorman; Thomas Cummins; Deirdre Kilbane; Padraig Dunne; Gerard O'Sullivan

doi:10.1117/12.916308

23 March 2012 Laser-produced plasma UTA emission in 3-7nm spectral region

Takeshi Higashiguchi, Takamitsu Otsuka, Noboru Yugami, Weihua Jiang, Akira Endo, Bowen Li, Colm O'Gorman, Thomas Cummins, Deirdre Kilbane, Padraig Dunne, Gerard O'Sullivan

Author Affiliations +

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 83222J (2012) https://doi.org/10.1117/12.916308
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

We demonstrate a table-top strong band emission water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays in the 2 to 4 nm region, extending below the carbon K edge (4.37 nm). Arrays resulting from n = 4-n = 4 transitions are overlaid with n = 4-n = 5 emission and shift to shorter wavelength with increasing atomic number. Under spectral analysis a guideline for microscope construction design for single-shot live cell imaging is proposed based on the use of a bismuth plasma source, coupled with multilayer mirror optics.

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Takeshi Higashiguchi, Takamitsu Otsuka, Noboru Yugami, Weihua Jiang, Akira Endo, Bowen Li, Colm O'Gorman, Thomas Cummins, Deirdre Kilbane, Padraig Dunne, and Gerard O'Sullivan "Laser-produced plasma UTA emission in 3-7nm spectral region", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83222J (23 March 2012); https://doi.org/10.1117/12.916308

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