Past, present, and future of backscatter electron (BSE) imaging

Oliver C. Wells; Michael S. Gordon; Lynne M. Gignac

doi:10.1117/12.920001

14 May 2012 Past, present, and future of backscatter electron (BSE) imaging

Oliver C. Wells, Michael S. Gordon, Lynne M. Gignac

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Proceedings Volume 8378, Scanning Microscopies 2012: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences; 837802 (2012) https://doi.org/10.1117/12.920001
Event: SPIE Defense, Security, and Sensing, 2012, Baltimore, Maryland, United States

Abstract

We describe developments in backscattered electron (BSE) imaging in the scanning electron microscope (SEM) beginning with the pioneering work of Von Ardenne and Knoll in Germany in the 1940's and Charles Oatley, Dennis McMullan, Kenneth Smith and others in the 1950's. Recent work on BSE imaging with very high energy (100's of KeV) electron beams, such as the inspection of voids in metallurgy under thick dielectrics in semiconductor back-end-of-the-line (BEOL) structures will be presented. Finally, we will look toward the future of BSE imaging in terms of the SEM's, detectors, and application areas.

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Oliver C. Wells, Michael S. Gordon, and Lynne M. Gignac "Past, present, and future of backscatter electron (BSE) imaging", Proc. SPIE 8378, Scanning Microscopies 2012: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences, 837802 (14 May 2012); https://doi.org/10.1117/12.920001

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