Upper roughness limitations on the TIS/RMS relationship

John C. Stover; Sven Schröder; Thomas A. Germer

doi:10.1117/12.930770

15 October 2012 Upper roughness limitations on the TIS/RMS relationship

John C. Stover, Sven Schröder, Thomas A. Germer

Proceedings Volume 8495, Reflection, Scattering, and Diffraction from Surfaces III; 849503 (2012) https://doi.org/10.1117/12.930770
Event: SPIE Optical Engineering + Applications, 2012, San Diego, California, United States

Abstract

The relationship between total integrated scatter and rms roughness was developed in the radar literature and enabled the first use of scatter measurements to monitor optical roughness. This relationship has been used and misused ever since. Its most common form makes use of a smooth surface approximation and has been applied to optical surfaces now for half a century. It has been suggested that Davies’ exponential form can be applied to much rougher surfaces. This paper investigates that issue through a combination of approximate and rigorous calculations made on optically deep sinusoidal gratings and a few measurements.

Citation Download Citation

John C. Stover, Sven Schröder, and Thomas A. Germer "Upper roughness limitations on the TIS/RMS relationship", Proc. SPIE 8495, Reflection, Scattering, and Diffraction from Surfaces III, 849503 (15 October 2012); https://doi.org/10.1117/12.930770

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