An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations

Laurent Gallais; Benoit Mangote; Mireille Commandré; Mathias Mende; Lars Jensen; Henrik Ehlers; Marco Jupé; Detlev Ristau; Andrius Melninkaitis; Valdas Sirutkaitis; Simonas Kičas; Tomas Tolenis; Ramutis Drazdys

doi:10.1117/12.977553

29 November 2012 An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations

Laurent Gallais, Benoit Mangote, Mireille Commandré, Mathias Mende, Lars Jensen, Henrik Ehlers, Marco Jupé, Detlev Ristau, Andrius Melninkaitis, Valdas Sirutkaitis, Simonas Kičas, Tomas Tolenis, Ramutis Drazdys

Author Affiliations +

Proceedings Volume 8530, Laser-Induced Damage in Optical Materials: 2012; 85300K (2012) https://doi.org/10.1117/12.977553
Event: SPIE Laser Damage, 2012, Boulder, Colorado, United States

Abstract

We report on the laser damage resistance of thin films prepared by Ion Beam Sputtering. The samples are fused silica substrates coated with single layer films of pure oxides (SiO₂, Nb₂O₅, ZrO₂, HfO₂, Ta₂O₅, Al₂O₃, Sc₂O₃) and oxide mixtures with various ratios (Nb₂O₅/SiO₂, ZrO₂/SiO₂, HfO₂/SiO_2,Ta₂O₅/SiO₂, Al₂O₃/SiO₂ and Sc₂O_3/SiO₂). For this study the LIDT of more than 60 different samples have measured at 1030nm with pulse durations of 500fs with single pulse irradiation. The results are expressed and compared in terms of LIDT as a function of the measured band gap energy and refractive index. For simple oxide materials a linear evolution of the LIDT with bandgap is observed, with the exception of Sc₂O₃material where a very high damage threshold is observed, compared to other high index materials. In the case of mixtures, a more complex behavior is evidenced.

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Laurent Gallais, Benoit Mangote, Mireille Commandré, Mathias Mende, Lars Jensen, Henrik Ehlers, Marco Jupé, Detlev Ristau, Andrius Melninkaitis, Valdas Sirutkaitis, Simonas Kičas, Tomas Tolenis, and Ramutis Drazdys "An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations", Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85300K (29 November 2012); https://doi.org/10.1117/12.977553

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