A slim column cell of 12nm resolution for wider application of e-beam lithography

Akio Yamada; Hitoshi Tanaka; Tomohiko Abe; Youichi Shimizu

doi:10.1117/12.2011376

26 March 2013 A slim column cell of 12nm resolution for wider application of e-beam lithography

Akio Yamada, Hitoshi Tanaka, Tomohiko Abe, Youichi Shimizu

Proceedings Volume 8680, Alternative Lithographic Technologies V; 868025 (2013) https://doi.org/10.1117/12.2011376
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

The authors designed novel electron beam slim column cells that have the outer diameters of 60mm and 40mm in width for an e-beam exposure of patterns down to 12nm and below. The column has maximum magnetic flux density of less than 2.2Tesla in the pole-piece of objective lens. No magnetic saturation occurs in the lens. The 12-88% blur at shaped beam edges through the column is better than 12nm to expose 12nm 1:1 LS patterns. Calorific power by lens coil of the column is smaller than 200watt. This slim column cell of high resolution and small size will provide various types of electron beam exposure systems with single or multiple exposure columns.

Citation Download Citation

Akio Yamada, Hitoshi Tanaka, Tomohiko Abe, and Youichi Shimizu "A slim column cell of 12nm resolution for wider application of e-beam lithography", Proc. SPIE 8680, Alternative Lithographic Technologies V, 868025 (26 March 2013); https://doi.org/10.1117/12.2011376

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