Next generation electron beam lithography system F7000 for wide range applications

Hirofumi Hayakawa; Masahiro Takizawa; Masaki Kurokawa; Akiyoshi Tsuda; Masami Takigawa; Shin-ichi Hamaguchi; Akio Yamada; Kiichi Sakamoto; Takayuki Nakamura

doi:10.1117/12.2029193

28 June 2013 Next generation electron beam lithography system F7000 for wide range applications

Hirofumi Hayakawa, Masahiro Takizawa, Masaki Kurokawa, Akiyoshi Tsuda, Masami Takigawa, Shin-ichi Hamaguchi, Akio Yamada, Kiichi Sakamoto, Takayuki Nakamura

Author Affiliations +

Proceedings Volume 8701, Photomask and Next-Generation Lithography Mask Technology XX; 870103 (2013) https://doi.org/10.1117/12.2029193
Event: Photomask and NGL Mask Technology XX, 2013, Yokohama, Japan

Abstract

For multi-purpose applications such as advanced LSIs, photonics, MEMS, and other nano- fabrications, it is important for electron beam (EB) writers that handle the various substrates with their own single mechanical platform. We have been developing the adjusting pallet function both 200mm and 300mm bases to satisfy this requirement. By analyzing actual examples of adjusting pallets we proved their effectiveness to their applications. The combination of adjusting pallet function, 1Xnm resolution column and character projection technologies will enable the next generation EB writer “F7000” to fit from Fab to Lab applications.

Citation Download Citation

Hirofumi Hayakawa, Masahiro Takizawa, Masaki Kurokawa, Akiyoshi Tsuda, Masami Takigawa, Shin-ichi Hamaguchi, Akio Yamada, Kiichi Sakamoto, and Takayuki Nakamura "Next generation electron beam lithography system F7000 for wide range applications", Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 870103 (28 June 2013); https://doi.org/10.1117/12.2029193

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