Inorganic resist materials based on zirconium phosphonate for atomic force microscope lithography

Mankyu Kang; Seonae Kim; JinHyuck Jung; Heebom Kim; Inkyun Shin; Chanuk Jeon; Haiwon Lee

doi:10.1117/12.2045641

27 March 2014 Inorganic resist materials based on zirconium phosphonate for atomic force microscope lithography

Mankyu Kang, Seonae Kim, JinHyuck Jung, Heebom Kim, Inkyun Shin, Chanuk Jeon, Haiwon Lee

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 90511U (2014) https://doi.org/10.1117/12.2045641
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

New inorganic resist materials based on metal complexes were investigated for atomic force microscope (AFM) lithography. Phosphoric acids are good for self-assembly because of their strong binding energy. In this work, zirconium phosphonate system are newly synthesized for spin-coatable materials in aqueous solutions and leads to negative tone pattern for improving line edge roughness. Low electron exposure by AFM lithography could generate a pattern by electrochemical reaction and cross-linking of metal-oxo complexes. It has been reported that the minimum pattern results are affected by lithographic speed, and the applied voltage between a tip and a substrate.

Citation Download Citation

Mankyu Kang, Seonae Kim, JinHyuck Jung, Heebom Kim, Inkyun Shin, Chanuk Jeon, and Haiwon Lee "Inorganic resist materials based on zirconium phosphonate for atomic force microscope lithography", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511U (27 March 2014); https://doi.org/10.1117/12.2045641

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