Flexible amorphous oxide thin-film transistors on polyimide substrate for AMOLED

Zhiping Xu; Min Li; Miao Xu; Jianhua Zou; Zhuo Gao; Jiawei Pang; Ying Guo; Lei Zhou; Chunfu Wang; Dong Fu; Junbiao Peng; Lei Wang; Yong Cao

doi:10.1117/12.2071794

24 October 2014 Flexible amorphous oxide thin-film transistors on polyimide substrate for AMOLED

Zhiping Xu, Min Li, Miao Xu, Jianhua Zou, Zhuo Gao, Jiawei Pang, Ying Guo, Lei Zhou, Chunfu Wang, Dong Fu, Junbiao Peng, Lei Wang, Yong Cao

Author Affiliations +

Proceedings Volume 9270, Optoelectronic Devices and Integration V; 92700A (2014) https://doi.org/10.1117/12.2071794
Event: SPIE/COS Photonics Asia, 2014, Beijing, China

Abstract

We report a flexible amorphous Lanthanide doped In-Zn-O (IZO) thin-film transistor (TFT) backplane on polyimide (PI) substrate. In order to de-bond the PI film from the glass carrier easily after the flexible AMOLED process, a special inorganic film is deposited on the glass before the PI film is coated. The TFT exhibited a field-effect mobility of 6.97 cm²V^-1 s^-1, a subthreshold swing of 0.248 V dec-1, and an I_on/I_off ratio of 5.19×107, which is sufficient to drive the OLEDs.

Citation Download Citation

Zhiping Xu, Min Li, Miao Xu, Jianhua Zou, Zhuo Gao, Jiawei Pang, Ying Guo, Lei Zhou, Chunfu Wang, Dong Fu, Junbiao Peng, Lei Wang, and Yong Cao "Flexible amorphous oxide thin-film transistors on polyimide substrate for AMOLED", Proc. SPIE 9270, Optoelectronic Devices and Integration V, 92700A (24 October 2014); https://doi.org/10.1117/12.2071794

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