Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene

Man Zhang; Qiling Deng; Lifang Shi; Hui Pang; Axiu Cao; Song Hu

doi:10.1117/12.2073892

13 November 2014 Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene

Man Zhang, Qiling Deng, Lifang Shi, Hui Pang, Axiu Cao, Song Hu

Proceedings Volume 9277, Nanophotonics and Micro/Nano Optics II; 92771U (2014) https://doi.org/10.1117/12.2073892
Event: SPIE/COS Photonics Asia, 2014, Beijing, China

Abstract

This paper demonstrates an approach to fabricate nano-pillar based on thiol-ene via soft-lithography. The template is anodic aluminum oxygen (AAO) with ordered nano-holes with the diameter of 90nm.The nano-pillar consists of rigid thiol-ene features on an elastic poly(dimethylsiloxane) (PDMS) support. It is capable of patterning both flat and curved substrate. The thiol-ene is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. Here, we fabricated a two-layer structure, which included rigid thiol-ene nano-pillar with sub-100nm resolution and soft PDMS substrate. The experiment results show that this approach can be used to fabricate high-resolution features and the thiol-ene is an excellent imprint material. The fabrication technique in this paper is simple, low-cost, high-resolution and easy to high throughput, which has broad application prospects in the preparation of nanostructures.

Citation Download Citation

Man Zhang, Qiling Deng, Lifang Shi, Hui Pang, Axiu Cao, and Song Hu "Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene", Proc. SPIE 9277, Nanophotonics and Micro/Nano Optics II, 92771U (13 November 2014); https://doi.org/10.1117/12.2073892

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