Application of differential phase contrast imaging to EUV mask inspection: a numerical study

Xibin Zhou; Dominic Ashworth; Frank Goodwin; Kevin Cummings

doi:10.1117/12.2085945

6 April 2015 Application of differential phase contrast imaging to EUV mask inspection: a numerical study

Xibin Zhou, Dominic Ashworth, Frank Goodwin, Kevin Cummings

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 94221E (2015) https://doi.org/10.1117/12.2085945
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

We demonstrate numerically that oblique off-axis illumination could enhance the contrast and extend the depth of focus of EUV phase defects detection. In addition to quantitative observation, it also allows us to extract the resolution-limited defect phase profiles quantitatively. This scheme can be easily implemented in both full field and scanning mask inspection tools.

Citation Download Citation

Xibin Zhou, Dominic Ashworth, Frank Goodwin, and Kevin Cummings "Application of differential phase contrast imaging to EUV mask inspection: a numerical study", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221E (6 April 2015); https://doi.org/10.1117/12.2085945

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