Development of a comprehensive metrology platform dedicated to dimensional measurements of CD atomic force microscopy tips

Johann Foucher; Sebastian W. Schmidt; Aurelien Labrosse; Alexandre Dervillé; Sandra Bos; Sebastian Schade; Bernd Irmer

doi:10.1117/12.2085977

19 March 2015 Development of a comprehensive metrology platform dedicated to dimensional measurements of CD atomic force microscopy tips

Johann Foucher, Sebastian W. Schmidt, Aurelien Labrosse, Alexandre Dervillé, Sandra Bos, Sebastian Schade, Bernd Irmer

Author Affiliations +

Proceedings Volume 9424, Metrology, Inspection, and Process Control for Microlithography XXIX; 94240S (2015) https://doi.org/10.1117/12.2085977
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

In this paper, we present our most recent approach on the extraction of reliable atomic force microscopy (AFM) tip dimensions from scanning electron microscopy (SEM) images in order to answer future requirements on ever shrinking CD AFM tips. We demonstrate the capabilities of a newly developed, fully automatic analysis software based on advanced SEM image modeling and user a-priori knowledge integration in SEM image analysis algorithm. The impact of such breakthrough technology will be shown as a function of its stability and robustness by varying tip shape, imaging settings, and SEM setup parameters. The extracted values are compared to data yielded from a commonly used SEM image analysis approach based on threshold type algorithms, and directly related to reference CD AFM measurements. We will discuss the prospective challenges accompanied with shrinking tip dimensions and the potential of a comprehensive data fusion approach, which can be used for both R&D and high volume production.

Citation Download Citation

Johann Foucher, Sebastian W. Schmidt, Aurelien Labrosse, Alexandre Dervillé, Sandra Bos, Sebastian Schade, and Bernd Irmer "Development of a comprehensive metrology platform dedicated to dimensional measurements of CD atomic force microscopy tips", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94240S (19 March 2015); https://doi.org/10.1117/12.2085977

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