Paper
16 January 1989 Moire Interferometry Applied To Topographic Contour Measurement
Y. Z. Dai, F. P. Chiang
Author Affiliations +
Proceedings Volume 0954, Optical Testing and Metrology II; (1989) https://doi.org/10.1117/12.947584
Event: SPIE International Symposium on Optical Engineering and Industrial Sensing for Advance Manufacturing Technologies, 1988, Dearborn, MI, United States
Abstract
Moire interferometry in this paper is extended to topographic contour measurement of an arbitrary object. The principle of the proposed method is different from that of projection moire and shadow moire methods in both the moire fringe forming mechanism and the w displacement evaluation. The advantage of the present method over the others is that it has a very high sensitivity which can be the order of Amm. As an experimental verification, the method is applied to the topographic contour measurement of a cylindrical shell with and without a diametric point loading.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Y. Z. Dai and F. P. Chiang "Moire Interferometry Applied To Topographic Contour Measurement", Proc. SPIE 0954, Optical Testing and Metrology II, (16 January 1989); https://doi.org/10.1117/12.947584
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Cited by 1 scholarly publication and 2 patents.
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KEYWORDS
Moire patterns

Deflectometry

Fringe analysis

Optical testing

Holography

Speckle

Mechanics

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