A method to diagnose and combat index of refraction non-uniformity in evaporative optical coatings

Joel Bagwell; Chris Cook; Craig Ament

doi:10.1117/12.2197929

11 October 2015 A method to diagnose and combat index of refraction non-uniformity in evaporative optical coatings

Joel Bagwell, Chris Cook, Craig Ament

Proceedings Volume 9633, Optifab 2015; 963310 (2015) https://doi.org/10.1117/12.2197929
Event: SPIE Optifab, 2015, Rochester, New York, United States

Abstract

In an optical coating, the thin film engineer must control film thickness and index of refraction to achieve high optical coating performance. While film thickness can generally be controlled with sweeps, sources, and distribution shields, index can be a tougher problem to solve. Often times, contaminants affect the index of refraction of a thin film and cause variations within different portions of the coating chamber leading to poor yield. Presented here is a methodology and case study used to diagnose index of refraction non-uniformity as well as identify the potential sources of contaminants in the system using a combination of Residual Gas Analysis and Secondary Ion Mass Spectrometry.

Citation Download Citation

Joel Bagwell, Chris Cook, and Craig Ament "A method to diagnose and combat index of refraction non-uniformity in evaporative optical coatings", Proc. SPIE 9633, Optifab 2015, 963310 (11 October 2015); https://doi.org/10.1117/12.2197929

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