Rapidly removing grinding damage layer on fused silica by inductively coupled plasma processing

Heng Chen; Lin Zhou; Xuhui Xie; Baolu Shi; Haobin Xiong

doi:10.1117/12.2244602

28 October 2016 Rapidly removing grinding damage layer on fused silica by inductively coupled plasma processing

Heng Chen, Lin Zhou, Xuhui Xie, Baolu Shi, Haobin Xiong

Author Affiliations +

Proceedings Volume 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 96830B (2016) https://doi.org/10.1117/12.2244602
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China

Abstract

During the conventional optical shaping process of fused silica, lapping is generally used to remove grinding damage layer. But this process is of low efficiency, it cannot meet the demand of large aperture optical components. Therefore, Inductively Coupled Plasma Processing (ICPP) was proposed to remove grinding damage layer instead of lapping. ICPP is a non-contact, deterministic figuring technology performed at atmospheric pressure. The process benefits from its ability to simultaneously remove sub-surface damage (SSD) while imparting the desired figure to the surface with high material remove rate. The removing damage capability of ICPP has preliminarily been confirmed on medium size optical surfaces made of fused silica, meanwhile serious edge warping was found. This paper focused on edge effect and a technique has been designed to compensate for these difficulties. Then it was demonstrated on a large aperture fused silica mirror (Long320mm×Wide370mm×High50mm), the removal depth was 30.2μm and removal rate got 6.6mm3/min. The results indicate that ICPP can rapidly remove damage layer on the fused silica induced by the previous grinding process and edge effect is effective controlled.

Citation Download Citation

Heng Chen, Lin Zhou, Xuhui Xie, Baolu Shi, and Haobin Xiong "Rapidly removing grinding damage layer on fused silica by inductively coupled plasma processing", Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 96830B (28 October 2016); https://doi.org/10.1117/12.2244602

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE