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AuthorsNumbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B...0Z, followed by 10-1Z, 20-2Z, etc. Abramski, Krzysztof M., 09, 1T Ackermann, Roland, 0T Antończak, Arkadiusz J., 09, 1T Ardron, Marcus, 0K Balčytis, Armandas, 0G Bayer, L., 1K Bechtold, Peter, 0L Beresna, M., 0U Bergner, Klaus, 0T Blass, David, 14 Bliedtner, Jens, 19 Bobrinetskiy, Ivan I., 0B Bonati, Guido, 1P Booth, M. J., 12 Burgui, Saioa, 11 Cai, Jinguang, 0D, 1D Carter, Richard M., 15, 1M Čerkauskaitė, A., 0U Chen, Jinanyong, 15, 1M Chen, K., 1S Delmdahl, Ralph, 1P Dickmann, Klaus, 0P, 0S Dilger, Klaus, 0V, 14 Dostalek, M., 1J Drevinskas, R., 0U Ehrhardt, M., 1K Elder, Ian, 15 Emelianov, Alexey V., 0B Enoki, Shinichi, 1I Esser, Hans-Gerd, 1P Esser, M. J. Daniel, 15 Fan, Lidan, 0D Faucon, M., 0W Fleureau, M., 0W Friedel, Susanna, 0F Friedrich, Maria, 19 Fu, Chien-Chung, 0Y Gaebler, Frank, 04 Gailevčius, Darius, 08 Gamaly, Eugene, 08 Gil, Carmen, 11 Grefe, Hinrich, 0V Guenther, Denise, 11 Gurevich, E. L., 0O Hand, Duncan P., 0K, 15, 1M Harth, F., 0N Heber, Jörg, 1G Heberle, Johannes, 0L Helbig, Ralf, 11 Held, Andrew, 04 Herrmann, T., 0N Hevonkorpi, V., 02 Hierl, S., 1J Hillman, J., 0E Höche, Thomas, 0C Hoffman, Hans-Dieter, 14 Hoppius, Jan S., 0O Huang, X., 1S Janschek, Klaus, 1G Jonavičius, Tomas, 08 Jungbluth, Bernd, 14 Juodkazis, Saulius, 08, 0G Juodkazyte, Jurga, 0G Kammel, Robert, 0T Kanitz, A., 0O Kazansky, P. G., 0U Kling, R., 0W Kloetzer, Sascha, 0R Krause, Michael, 0C Kreling, Stefan, 0V, 14 Lamb, Robert A., 15 Lang, Valentin, 0Z Lasa, Inigo, 11 Lasagni, Andrés F., 0Z, 11 L'huillier, J. A., 0N Li, S., 1S Li, Xijun, 0G Lin, Te-Hsun, 0Y Liu, L., 1S Loeschner, Udo, 0R Lorenz, P., 1K Lu, Y. F., 1S Lu, Yao, 1S Lundén, H., 02 Määttänen, A., 02 Malinauskas, Mangirdas, 08 Matsumoto, Aoi, 1I Meier, Linus, 1O Miller, D., 0E Mincuzzi, G., 0W Mizeikis, Vygantas, 08 Muttaqin, 17 Nakamura, Takahiro, 17 Niaura, Gediminas, 0G Nolte, Stefan, 0T Nyga, Sebastian, 14 Ohmura, Etsuji, 1I Oropeza, M., 0E Ostendorf, A., 0O Otero, Nerea, 0B Patel, A., 0U Petsch, Tino, 0C Pezowicz, Celina, 1T Pfaff, Josquin, 1O Piontek, M. C., 0N Qin, Gang, 0D Rekštyte, Sima, 08 Risser, C., 0E Roch, Teja, 0Z Romero, Pablo M., 0B Roth, Matthias, 1G Salter, P. S., 12 Sato, Shunichi, 17 Schille, Joerg, 0R Schindler, Christian, 19 Schmailzl, A., 1J Schmidt, Michael, 0L Schneider, Lutz, 0R Seniutinas, Gediminas, 0G Skupin, Stefan, 0T Smarra, Marco, 0P, 0S Solano, Cristina, 11 Steger, S., 1J Stępak, Bogusz D., 09, 1T Stolberg, Klaus, 0F Strauß, Johannes, 0L Streek, André, 0R Strube, Anja, 0S Sukhman, Y., 0E Sun, B., 12 Szustakiewicz, Konrad, 1T Tamaki, Takayuki, 1I Thomas, Jens U., 0T Thomson, Robert R., 15, 1M Toledo-Arana, Alejandro, 11 Troughton, Michael, 15 Valle, Jaoine, 11 van Nunen, Joris, 04 Wagner, Uwe, 0C Walter, Christian, 1O Warhanek, Maximilian G., 1O Watanabe, Akira, 0D, 1D Wegener, Konrad, 1O Werner, Carsten, 11 Weston, Nick J., 0K Westphalen, Thomas, 14 Wlodarczyk, Krystian L., 0K Wu, Yu-Xiang, 0Y Yahata, Keisuke, 11 Yang, Yin-Kuang, 0Y Yu, Chun-Wen, 0Y Zajadazc, J., 1K Zhang, J., 0U Zimmer, K., 1K Conference CommitteeSymposium Chairs Guido Hennig, Daetwyler Graphics AG (Switzerland) Yongfeng Lu, University of Nebraska-Lincoln (United States)
Symposium Co-chairs Reinhart Poprawe, Fraunhofer-Institut für Lasertechnik (Germany) Koji Sugioka, RIKEN (Japan)
Program Track Chairs Henry Helvajian, The Aerospace Corporation (United States) Alberto Piqué, U.S. Naval Research Laboratory (United States)
Conference Chair Conference Co-chairs Kunihiko Washio, Paradigm Laser Research Ltd. (Japan) Craig B. Arnold, Princeton University (United States)
Conference Program Committee Antonio Ancona, CNR-Institute for Photonics and Nanotechnologies (Italy) Arkadiusz J. Antonczak, Wroclaw University of Technology (Poland) Jiyeon Choi, Korea Institute of Machinery & Materials (Korea, Republic of) Francois Courvoisier, FEMTO-ST (France) Chunlei Guo, University of Rochester (United States) Miguel Holgado Bolaños, Universidad Politécnica de Madrid (Spain) Minghui Hong, National University of Singapore (Singapore) Rainer Kling, ALPhANOV (France) Andres F. Lasagni, Fraunhofer IWS Dresden (Germany) Yongfeng Lu, University of Nebraska-Lincoln (United States) Andreas E. H. Oehler, Time-Bandwidth Products JDSU (Switzerland) Yasuhiro Okamoto, Okayama University (Japan) Roberto Osellame, Politecnico di Milano (Italy) Andreas Ostendorf, Ruhr-Universität Bochum (Germany) Wilhelm Pfleging, Karlsruhe Institute of Technology (Germany) Alberto Piqué, U.S. Naval Research Laboratory (United States) Martin Sharp, Liverpool John Moores University (United Kingdom) Razvan Stoian, Laboratoire Hubert Curien (France) Koji Sugioka, RIKEN (Japan) Hong-Bo Sun, Jilin University (China) Jorma Vihinen, Tampere University of Technology (Finland) Akira Watanabe, Tohoku University (Japan) Michael J. Withford, Macquarie University (Australia) Xianfan Xu, Purdue University (United States) Haibin Zhang, Electro Scientific Industries, Inc. (United States) Haiyan Zhao, Tsinghua University (China)
Session Chairs 1 Laser Micro-Structuring and Processing I Udo Klotzbach, Fraunhofer IWS Dresden (Germany) 2 Laser Nano-Structuring and Processing Haibin Zhang, Electro Scientific Industries, Inc. (United States) 3 Laser Micro-Structuring and Processing II François Courvoisier, FEMTO-ST (France) 4 Direct Write Processing, Ablation, and Surface Modification I Kunihiko Washio, Paradigm Laser Research Ltd. (Japan) 5 High Speed Laser Beam Engineering Systems for High Power Ultra Short Pulsed Laser I Michael J. Withford, Macquarie University (Australia) 6 High Speed Laser Beam Engineering Systems for High Power Ultra Short Pulsed Laser II Andrés F. Lasagni, Fraunhofer IWS Dresden (Germany) 7 Direct Write Processing, Ablation, and Surface Modification II: Ultrafast Laser Machining Applications Hong-Bo Sun, Jilin University (China) 8 Large Area Micro/Nano Structuring, Laser Interference Patterning Chunlei Guo, University of Rochester (United States) 9 Ultrafast Laser Machining Applications I Wilhelm Pfleging, Karlsruhe Institute of Technology (Germany) 10 Ultrafast Laser Machining Applications II Craig B. Arnold, Princeton University (United States) 11 Advanced Laser Structuring for Energy Storage and Conversion Udo Klotzbach, Fraunhofer IWS Dresden (Germany)
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