Structured amplitude and phase fields behind microstructures: the quest for high contrast modulation at proximity

Toralf Scharf; Myun-Sik Kim; Krishnaparvathy Puthankovilakam; Johana Bernasconi; Hans-Peter Herzig; Uwe Vogler; Reinhard Voelkel

doi:10.1117/12.2214341

4 March 2016 Structured amplitude and phase fields behind microstructures: the quest for high contrast modulation at proximity

Toralf Scharf, Myun-Sik Kim, Krishnaparvathy Puthankovilakam, Johana Bernasconi, Hans-Peter Herzig, Uwe Vogler, Reinhard Voelkel

Author Affiliations +

Proceedings Volume 9764, Complex Light and Optical Forces X; 97640B (2016) https://doi.org/10.1117/12.2214341
Event: SPIE OPTO, 2016, San Francisco, California, United States

Abstract

Microstructures can be used to realize repetitive and singular high contrast features at different distances behind a structure. For practical applications, the amplitude field needs to be considered. To realize defined amplitude features at long distances behind the surface of reference, the phase of the light field plays a crucial role. The highest contrast can be reached if phase singularities (or phase jumps) can be used because at the positions of their appearance in space the intensity becomes zero. In practice, it is important to identify cases where phase singularities can be designed in position in space. As a first example, we will discuss the case of phase fields produced by Talbot light carpets for wavelength-scale amplitude gratings. Such systems are used today in lithography to print small repetitive structures. For arbitrary structures to be printed, different design strategies are necessary. As a second example we will discuss the case of rule based design phase mask technique to realize high-resolution prints at proximity. In such a case phase singularities are created at the phase level and can be found still at long distances, which leads to high contrast modulation far behind the microstructure. An interesting situation appears when a fully optimized diffractive optical structure is used to create particular amplitude fields at defined proximity distances. We will discuss the appearance of phase singularities behind the structure in such a case and give details of their behavior at long proximity distances.

Citation Download Citation

Toralf Scharf, Myun-Sik Kim, Krishnaparvathy Puthankovilakam, Johana Bernasconi, Hans-Peter Herzig, Uwe Vogler, and Reinhard Voelkel "Structured amplitude and phase fields behind microstructures: the quest for high contrast modulation at proximity", Proc. SPIE 9764, Complex Light and Optical Forces X, 97640B (4 March 2016); https://doi.org/10.1117/12.2214341

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Phase shift keying

Phase measurement

Modulation

Printing

Lithography

Neodymium

Show All Keywords

Keywords/Phrases

Search In:

Publication Years