Polarization aberrations induced by graded multilayer coatings in EUV lithography scanners

Thiago S. Jota; Russell A. Chipman

doi:10.1117/12.2218918

18 March 2016 Polarization aberrations induced by graded multilayer coatings in EUV lithography scanners

Thiago S. Jota, Russell A. Chipman

Proceedings Volume 9776, Extreme Ultraviolet (EUV) Lithography VII; 977617 (2016) https://doi.org/10.1117/12.2218918
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

The functional form of coating-induced polarization aberrations in EUV lithography systems is evaluated through polarization ray tracing of an example 3×EUV scanner with state-of-the-art graded multilayer coatings. In particular, the impact of coating-induced on-axis astigmatism, as well as diattenuation and retardance on image quality are investigated. The point spread function (PSF) consists of four polarization-dependent components: two are nearly diffraction limited and two are highly apodized, and all components can be described by a Mueller matrix Point Spread Matrix (PSM). The highly apodized components are “ghost” images that are larger than the diffraction limit, reducing image contrast and resolution.

Citation Download Citation

Thiago S. Jota and Russell A. Chipman "Polarization aberrations induced by graded multilayer coatings in EUV lithography scanners", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977617 (18 March 2016); https://doi.org/10.1117/12.2218918

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