Deep-UV interference lithography combined with masked contact lithography for pixel wiregrid patterns

David Lombardo; Piyush Shah; Pengfei Guo; Andrew Sarangan

doi:10.1117/12.2219484

1 April 2016 Deep-UV interference lithography combined with masked contact lithography for pixel wiregrid patterns

David Lombardo, Piyush Shah, Pengfei Guo, Andrew Sarangan

Proceedings Volume 9777, Alternative Lithographic Technologies VIII; 97771N (2016) https://doi.org/10.1117/12.2219484
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Pixelated wiregrids are of great interest in polarimetric imagers, but there are no straightforward methods available for combining the uniform exposures of laser interference with a masking system to achieve pixels at different rotational angles. In this work we demonstrate a 266nm deep-UV interference lithography combined with a traditional i-line contact lithography to create such pixels. Aluminum wiregrids are first made, following by etching to create the pixels, and then a planarizing molybdenum film is used before patterning subsequent pixel arrays. The etch contrast between the molybdenum and the aluminum enables the release of the planarizing layer.

Citation Download Citation

David Lombardo, Piyush Shah, Pengfei Guo, and Andrew Sarangan "Deep-UV interference lithography combined with masked contact lithography for pixel wiregrid patterns", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97771N (1 April 2016); https://doi.org/10.1117/12.2219484

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