Multi-beam mask writer MBM-1000 and its application field

Hiroshi Matsumoto; Hideo Inoue; Hiroshi Yamashita; Hirofumi Morita; Satoru Hirose; Munehiro Ogasawara; Hirokazu Yamada; Kiyoshi Hattori

doi:10.1117/12.2245177

10 May 2016 Multi-beam mask writer MBM-1000 and its application field

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Hirofumi Morita, Satoru Hirose, Munehiro Ogasawara, Hirokazu Yamada, Kiyoshi Hattori

Author Affiliations +

Proceedings Volume 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 998405 (2016) https://doi.org/10.1117/12.2245177
Event: Photomask Japan 2016, 2016, Yokohama, Japan

Abstract

NuFlare has started development of multi-beam mask writer MBM-1000 aiming to apply to N5 and to release in Q4 2017. MBM-1000 is based on large area projection optics with shaping aperture array plate, blanking aperture array (BAA) plate, single cathode and inline/realtime data path for vector data rasterization and bitmap dose correction. It is designed to accomplish higher throughput than EBM series (variable shaped beam (VSB) writers) with massive beam array, higher resolution by using 10-nm beam size and 10-bit dose control, and better writing accuracy with more write passes. Configuration of MBM-1000 and flow of data path processing are described. Write time estimation suggests MBM-1000 has advantage over VSB writer with shot count > 200 Gshot/pass and resist sensitivity >75 μC/cm². Printing test of 20 nm hp 1:1 line and space pattern with ZEP-520 resist showed better beam resolution of MBM-1000 alpha tool than EBM series.

Citation Download Citation

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Hirofumi Morita, Satoru Hirose, Munehiro Ogasawara, Hirokazu Yamada, and Kiyoshi Hattori "Multi-beam mask writer MBM-1000 and its application field", Proc. SPIE 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 998405 (10 May 2016); https://doi.org/10.1117/12.2245177

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