High-efficiency photolithographic NIR metalenses enabled by optical proximity correction with a neural-network lithographic model

Hsuehli Liu; Weiping Liao; Yuteng Chen; Shengsiang Su; Tongke Lin; Jiamin Shieh; Peichen Yu; Youchia Chang

doi:10.1117/12.2644847

3 October 2022 High-efficiency photolithographic NIR metalenses enabled by optical proximity correction with a neural-network lithographic model

Hsuehli Liu, Weiping Liao, Yuteng Chen, Shengsiang Su, Tongke Lin, Jiamin Shieh, Peichen Yu, Youchia Chang

Author Affiliations +

Proceedings Volume PC12195, Metamaterials, Metadevices, and Metasystems 2022; PC1219521 (2022) https://doi.org/10.1117/12.2644847
Event: SPIE Nanoscience + Engineering, 2022, San Diego, California, United States

Conference Poster

Abstract

This conference presentation was prepared for the Metamaterials, Metadevices, and Metasystems 2022 conference at SPIE Optics + Photonics 2022.

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Hsuehli Liu, Weiping Liao, Yuteng Chen, Shengsiang Su, Tongke Lin, Jiamin Shieh, Peichen Yu, and Youchia Chang "High-efficiency photolithographic NIR metalenses enabled by optical proximity correction with a neural-network lithographic model", Proc. SPIE PC12195, Metamaterials, Metadevices, and Metasystems 2022, PC1219521 (3 October 2022); https://doi.org/10.1117/12.2644847

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