The EUV mask exposed

Vicky Philipsen; Devesh Thakare; Dongbo Xu; Ling Ee Tan; Jetske Stortelder; Mike Cooke; Andy Goodyear; Victor Soltwisch; Qais Saadeh; Sascha Brose; Andreas Erdmann

doi:10.1117/12.2641306

15 September 2022 The EUV mask exposed

Vicky Philipsen, Devesh Thakare, Dongbo Xu, Ling Ee Tan, Jetske Stortelder, Mike Cooke, Andy Goodyear, Victor Soltwisch, Qais Saadeh, Sascha Brose, Andreas Erdmann

Author Affiliations +

Proceedings Volume PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; PC123250B (2022) https://doi.org/10.1117/12.2641306
Event: Photomask Japan 2022, 2022, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 2022.

Conference Presentation

Citation Download Citation

Vicky Philipsen, Devesh Thakare, Dongbo Xu, Ling Ee Tan, Jetske Stortelder, Mike Cooke, Andy Goodyear, Victor Soltwisch, Qais Saadeh, Sascha Brose, and Andreas Erdmann "The EUV mask exposed", Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250B (15 September 2022); https://doi.org/10.1117/12.2641306

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