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This conference presentation was prepared for Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 2022.
Renzo Capelli
"AIMS EUV phase metrology: ZEISS solution for the characterization of EUV phase shift masks", Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250G (15 September 2022); https://doi.org/10.1117/12.2656145
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Renzo Capelli, "AIMS EUV phase metrology: ZEISS solution for the characterization of EUV phase shift masks," Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250G (15 September 2022); https://doi.org/10.1117/12.2656145