AIMS EUV phase metrology: ZEISS solution for the characterization of EUV phase shift masks

Renzo Capelli

doi:10.1117/12.2656145

15 September 2022 AIMS EUV phase metrology: ZEISS solution for the characterization of EUV phase shift masks

Renzo Capelli

Proceedings Volume PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; PC123250G (2022) https://doi.org/10.1117/12.2656145
Event: Photomask Japan 2022, 2022, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 2022.

Conference Presentation

Citation Download Citation

Renzo Capelli "AIMS EUV phase metrology: ZEISS solution for the characterization of EUV phase shift masks", Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250G (15 September 2022); https://doi.org/10.1117/12.2656145

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available