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Integration of metasurfaces with planar waveguide integrated circuits can provide unique functionalities for beam shaping. Recent works show vertical integration of independently designed planar sources and metalenses, however this is not trivial or scalable. Here, we demonstrate an inverse design approach to co-optimize and merge grating and metalens functions into an out-of-plane beam shaper within a single 240nm silicon nitride layer. To exemplify, we demonstrate a 240nm thick meta-beam shaper that focuses 473nm light into a diffraction-limited spot with sidelobe suppression over 10dB. This approach for inverse design is generalizable to arbitrary beam shapes, unlocking a wide variety of applications.
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