Direct laser writing suitable resist based on the monomeric unit of chitin

Dominic Meiers; Maximilian Rothammer; Cordt Zollfrank; Georg von Freymann

doi:10.1117/12.2647964

17 March 2023 Direct laser writing suitable resist based on the monomeric unit of chitin

Dominic Meiers, Maximilian Rothammer, Cordt Zollfrank, Georg von Freymann

Proceedings Volume PC12433, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI; PC124330G (2023) https://doi.org/10.1117/12.2647964
Event: SPIE OPTO, 2023, San Francisco, California, United States

Abstract

We report a new biopolymer resist that uses functionalized N-acetylglucosamine (NAG) as a monomer and is suitable for direct laser writing (DLW). Since NAG is the monomeric unit of chitin, a biopolymer found in the exoskeletons of various arthropods, the resist expands the available DLW-suitable biopolymers from plant- to animal-based. Furthermore, we show that the simultaneous use of two different photoinitiators is advantageous over the use of only one initiator. Here, the first photoinitiator, which acts as a good two-photon absorber (2PA) for the wavelength used, radicalizes the second photoinitiator (poor 2PA), which is more suitable for crosslinking the NAG.

Conference Presentation

Citation Download Citation

Dominic Meiers, Maximilian Rothammer, Cordt Zollfrank, and Georg von Freymann "Direct laser writing suitable resist based on the monomeric unit of chitin", Proc. SPIE PC12433, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI, PC124330G (17 March 2023); https://doi.org/10.1117/12.2647964

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