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8 June 2023 Investigation of E-field distribution and film material influence on laser-induced contamination (Conference Presentation)
Tomas Tolenis, Lukas Ramalis, Mojmír Havlík, Jan Hrebicek, Bedrich Rus, Daniel Kramer
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Proceedings Volume PC12577, High-power, High-energy Lasers and Ultrafast Optical Technologies; PC125770A (2023) https://doi.org/10.1117/12.2669493
Event: SPIE Optics + Optoelectronics, 2023, Prague, Czech Republic
Abstract
Laser Induced Contamination (LIC) is one of the major issues in high energy high repetition rate laser systems. The growth of contamination during the operation of the laser influences the components spectral performance and can lead to the catastrophic damage. Several previous investigations indicate that LIC growth depends on the coatings material and even its deposition method. In our work, we investigate electron-beam deposited HR mirrors for the wavelength of 800 nm. Three different designs were tested in vacuum conditions under high repetition and high energy laser irradiation using femtosecond pulses. Two of the designs are based on quarter wavelength optical thickness (QWOT) layers: last layer of the first mirror is high refractive index film, hafnia in our case, and for the second mirrors the last layer was double QWOT of low refractive index film, silica in our case. For the last coating the E-field was modified by changing the last silica layer thickness. All samples were irradiated below the damage threshold level and LIC observed under confocal microscope. Analysis were obtained by comparing the influence of the last layer and E-field distribution within the multilayer coatings. Conclusions and recommendations for LIC reduction will be presented.
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Tomas Tolenis, Lukas Ramalis, Mojmír Havlík, Jan Hrebicek, Bedrich Rus, and Daniel Kramer "Investigation of E-field distribution and film material influence on laser-induced contamination (Conference Presentation)", Proc. SPIE PC12577, High-power, High-energy Lasers and Ultrafast Optical Technologies, PC125770A (8 June 2023); https://doi.org/10.1117/12.2669493
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KEYWORDS
Contamination
Mirrors
Film thickness
Optical coatings
Refractive index
Silica
Laser systems engineering
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