Shaping the future: the power of advanced OPC and mask technology

Linda K. Somerville

doi:10.1117/12.2686218

22 November 2023 Shaping the future: the power of advanced OPC and mask technology

Linda K. Somerville

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Proceedings Volume PC12751, Photomask Technology 2023; PC1275102 (2023) https://doi.org/10.1117/12.2686218
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

The semiconductor industry is constantly evolving, and advanced OPC and mask technologies are at the forefront of this evolution. In this keynote address, we will explore the power of these technologies and their role in shaping the future of the industry. Photomask technology and quality significantly influence how well semiconductor chip design objectives are realized in the final product. From enabling higher resolution lithography to improving yield and reducing costs, advanced OPC and mask technology have the potential to revolutionize the semiconductor industry. Through practical examples, we will demonstrate the impact of these technologies and provide insights into the future of semiconductor manufacturing. Join us as we explore how advanced OPC and mask technology are shaping the future of the industry.

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Linda K. Somerville "Shaping the future: the power of advanced OPC and mask technology", Proc. SPIE PC12751, Photomask Technology 2023, PC1275102 (22 November 2023); https://doi.org/10.1117/12.2686218

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