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10 April 2024 Polypeptoid brushes as growth-promoters in vapor phase infiltration for area-selective deposition of aluminum oxide hard masks
Beihang Yu, Maggy Harake, Yujin Lee, Stacey F. Bent, Ricardo Ruiz
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Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560S (2024) https://doi.org/10.1117/12.3011335
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
Bottom-up nanofabrication with area-selective deposition provides a viable way to minimize edge placement error in semiconductor manufacturing. Here we developed a class of polymers, polypeptoids, as growth promoters that enhance nucleation and growth of metal oxides in vapor phase infiltration for area-selective deposition, generating aluminum oxide hard masks for pattern transfer with high selectivity. This material platform, with its capability to efficiently promote metal oxide growth and versatility in monomer-level chemical functionality control, will enable new area-selective deposition and pattern transfer methods.
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Beihang Yu, Maggy Harake, Yujin Lee, Stacey F. Bent, and Ricardo Ruiz "Polypeptoid brushes as growth-promoters in vapor phase infiltration for area-selective deposition of aluminum oxide hard masks", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560S (10 April 2024); https://doi.org/10.1117/12.3011335
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KEYWORDS
Photomasks
Atomic layer deposition
Metal oxides
Lithography
Silicon
Optical lithography
Polymers
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