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4 October 2024 Automated nanoscale multi-layer optical materials growth with reactive magnetron sputtering and in situ ellipsometry
John G. Jones, Peter R. Stevenson, Maggie E. Lankford, Cynthia T. Bowers, Lirong Sun, Joseph Garbarino, Lyuba Kuznetsova
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Proceedings Volume PC13116, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XXI; PC1311602 (2024) https://doi.org/10.1117/12.3025638
Event: Nanoscience + Engineering, 2024, San Diego, California, United States
Abstract
A fully automated multi-target reactive magnetron sputtering (MS) process is presented in which real-time modeling and in situ standard or Mueller matrix ellipsometry is combined demonstrating growth of nanoscale multi-layer optical thin films having desired properties such as thickness, while observing properties such as index of refraction (n), extinction coefficient (k), and complex permittivity throughout growth. For each material layer isotropic or anisotropic properties as required can be modeled automatically in real-time, allowing for the development of hyperbolic metamaterials. In situ use of an RC2 ellipsometer from JA Woollam is presented, having a spectral range of 210nm - 2500nm. TEM measurements of the thin films are presented.
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John G. Jones, Peter R. Stevenson, Maggie E. Lankford, Cynthia T. Bowers, Lirong Sun, Joseph Garbarino, and Lyuba Kuznetsova "Automated nanoscale multi-layer optical materials growth with reactive magnetron sputtering and in situ ellipsometry", Proc. SPIE PC13116, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XXI, PC1311602 (4 October 2024); https://doi.org/10.1117/12.3025638
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KEYWORDS
Sputter deposition
Magnetrons
Ellipsometry
Hyperbolic metamaterials
Materials properties
Optical properties
Refractive index
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