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4 October 2024 High refractive index polymers for nano and micro optics elements
Keiko Munechika, Carlos Pina-Hernandez, Adam Legacy, Kaito Yamada, Scott Dhuey
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Proceedings Volume PC13116, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XXI; PC1311609 (2024) https://doi.org/10.1117/12.3027827
Event: Nanoscience + Engineering, 2024, San Diego, California, United States
Abstract
We report the development of a series of nanoparticle-free optical polymers with a high refractive index (n = 1.7 ~ 1.8) and high optical transparency for direct patterning and nanoimprint lithography applications. The polymer is ultraviolet-curable and contains no metal oxide fillers. It is one of the polymers with the highest refractive index value available amongst commercial filler-free materials. This new polymer can be patterned via photolithography and electron beam lithography, becoming the first high refractive index polymer with capabilities as a negative tone resist. These properties allow fast and easy prototyping and manufacturing of high refractive index optical devices, including microlens arrays, photonic integrated circuits, etc.
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Keiko Munechika, Carlos Pina-Hernandez, Adam Legacy, Kaito Yamada, and Scott Dhuey "High refractive index polymers for nano and micro optics elements", Proc. SPIE PC13116, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XXI, PC1311609 (4 October 2024); https://doi.org/10.1117/12.3027827
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KEYWORDS
Polymers
Refractive index
Optical components
Optical properties
Electron beam lithography
Micro optics
Nanoimprint lithography
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