Kinetic modeling of reactions following EUV exposure in an ESCAP photoresist

Jacob Milton; Samuel Blau; Frances Houle

doi:10.1117/12.3035720

13 November 2024 Kinetic modeling of reactions following EUV exposure in an ESCAP photoresist

Jacob Milton, Samuel Blau, Frances Houle

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC132150J (2024) https://doi.org/10.1117/12.3035720
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

Chemical reactions leading to latent image formation in Chemically Amplified Resists (CARs) upon EUV exposure remain poorly understood. One barrier to understanding exposure chemistry lies in the sheer number of possible, competing reactions that occur upon exposure. Thus, we have combined high-throughput density functional theory and a chemical reaction network to perform kinetic Monte Carlo modelling to predict reactions occurring in an ESCAP photoresist upon blanket EUV exposure. Our model predicts the formation of several products, some of which have been previously experimentally observed outgassing from ESCAP photoresists, as well as new products formed within the polymer matrix. Additionally, we have performed analysis of our simulations to better understand pathways by which these products form. Here, we describe the refinement of our model, relevant, qualitative results, and compare the output of our model to experiments.

Conference Presentation

Citation Download Citation

Jacob Milton, Samuel Blau, and Frances Houle "Kinetic modeling of reactions following EUV exposure in an ESCAP photoresist", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC132150J (13 November 2024); https://doi.org/10.1117/12.3035720

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