Plasma dynamics and future of LPP-EUV source for semiconductor manufacturing II

Hakaru Mizoguchi; Kentaro Tomita; Daisuke Nakamura; Yukihiro Yamagata; Takeshi Higashiguchi; Takashi Toshima; Hiroki Kondo; Takuji Sakamoto; Tanemasa Asano; Masaharu Shiratani; Atsushi Sunahara

doi:10.1117/12.3034536

13 November 2024 Plasma dynamics and future of LPP-EUV source for semiconductor manufacturing II

Hakaru Mizoguchi, Kentaro Tomita, Daisuke Nakamura, Yukihiro Yamagata, Takeshi Higashiguchi, Takashi Toshima, Hiroki Kondo, Takuji Sakamoto, Tanemasa Asano, Masaharu Shiratani, Atsushi Sunahara

Author Affiliations +

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC132150T (2024) https://doi.org/10.1117/12.3034536
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

In this conference, we will report about new EUV research activity in Kyushu-Univ. in Japan. We have been planning EUV Exposure Research Center for support material development (Fig.1) and also new high power EUV source investigation program has been on going. It’s trigger is donation of 30kW CO2 driver laser system from Gigaphoton Inc. in 2022. Also In this paper we will discuss about the Sn plasma dynamics which dominate the EUV emission by using Thomson Scattering (TS) measurement4）(Fig.3). Recent TS results have revealed whole profiles of electron temperature and ion density in the EUV sources. These results mention that there is still sufficient potential to increase EUV output power and conversion efficiency in near future. This conceptual investing encourage us to improve EUV Light Source performance.

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Hakaru Mizoguchi, Kentaro Tomita, Daisuke Nakamura, Yukihiro Yamagata, Takeshi Higashiguchi, Takashi Toshima, Hiroki Kondo, Takuji Sakamoto, Tanemasa Asano, Masaharu Shiratani, and Atsushi Sunahara "Plasma dynamics and future of LPP-EUV source for semiconductor manufacturing II", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC132150T (13 November 2024); https://doi.org/10.1117/12.3034536

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