Durability tests of EUV mask blank under scanner environment

Teruki Hoshino; Yohei Ikebe; Takahiro Onoue

doi:10.1117/12.3034674

13 November 2024 Durability tests of EUV mask blank under scanner environment

Teruki Hoshino, Yohei Ikebe, Takahiro Onoue

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC132150Z (2024) https://doi.org/10.1117/12.3034674
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

EUV scanner is an extreme environment under vacuum and high photon energy of EUV light. Hydrogen is used as a background gas to maintain the cleanliness of the inner walls of the EUV lithography system, mirrors, and mask surfaces. However, hydrogen plasma generated by EUV light reacts to the films of masks and mirrors. So those components should be durable in such an environment. We tried to develop methods to evaluate the durability for standard 6-inch blanks and patterned masks. Our in-house evaluation tools successfully evaluated the scanner compatibility and enabled to find a condition with high durability among various film configurations of EUV blank. We will also discuss how scanner environment impacts to the blank and mask properties.

Citation Download Citation

Teruki Hoshino, Yohei Ikebe, and Takahiro Onoue "Durability tests of EUV mask blank under scanner environment", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC132150Z (13 November 2024); https://doi.org/10.1117/12.3034674

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