Photon Source Technology for Lithography and Metrology: An Overview

Bakshi, Vivek, EUV Litho, Inc.

doi:10.1117/3.2638242.ch1

Book: Photon Sources for Lithography and Metrology

Editor(s): Vivek Bakshi

Author(s): Vivek Bakshi

Published: 2023

https://doi.org/10.1117/3.2638242.ch1

Author Affiliations +

Abstract

This chapter gives an overview of the technology, principles of operation, status, and requirements for current EUV sources utilized in EUVL scanners and metrology applications. Due to the sheer number of topics covered in this text, the intent is to summarize the material then direct the reader to the corresponding volume for more detailed coverage. In this current publication, the scope is limited to laser-produced plasmas and discharge-produced plasmas with tin and xenon as target materials—both of which have been used in R&D and HVM-related sources. EUV source technology that may be used for the extension of EUVL via wavelength reduction (Blue-X) is also briefly covered.