Journal of Micro/Nanolithography, MEMS, and MOEMS

Editor-in-Chief: Chris A. Mack,, USA

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Journal of Micro/Nanolithography, MEMS, and MOEMS

Introducing etch kernels for efficient pattern sampling and etch bias prediction

François Weisbuch, Andrey Lutich, and Jirka Schatz

Study on dynamic actuation in double microcantilever-based electrostatic microactuators with an in-house experimental set-up

Banibrata Mukherjee, Kenkere Balashanthamurthy Mruthyunjaya Swamy, and Siddhartha Sen

Design and simulation of MEMS-actuated adjustable optical wedge for laser beam scanners

Ahmed S. Bahgat et al.

March 2018


from the Journal of Micro/Nanolithography, MEMS, and MOEMS

Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching

Joshua M. Duran, Andrew Sarangan (2017) Open Access

Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application

Mohammed Ashraf, Sree V. Sundararajan, Gianluca Grenci (2017) Open Access

Fabrication and analysis of metallic nanoslit structures: advancements in the nanomasking method

Stephen J. Bauman, Ahmad A. Darweesh, Desalegn T. Debu, Joseph B. Herzog (2018) Open Access

kW-class picosecond thin-disc prepulse laser Perla for efficient EUV generation

Akira Endo, Martin Smrž, Jiří Mužík, Ondřej Novák, Michal Chyla, Tomáš Mocek (2017) Open Access

Pattern inspection of etched multilayer extreme ultraviolet mask

Susumu Iida, Ryoichi Hirano, Tsuyoshi Amano, Hidehiro Watanabe (2016) Open Access

Surface feature engineering through nanosphere lithography

Tod V. Laurvick, Ronald A. Coutu, Jr., James M. Sattler, Robert A. Lake (2016) Open Access

Large area gratings by x-ray LIGA dynamic exposure for x-ray phase-contrast imaging

Tobias J. Schröter et al. (2017)

Fabrication of quartz microcylinders by laser interference lithography for angular optical tweezers

Zhanna Santybayeva et al. (2016) Open Access

Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArFi and extreme ultraviolet lithography

Jo Finders, Laurens de Winter, Thorsten Last (2016) Open Access

Theoretical study for aerial image intensity in resist in high numerical aperture projection optics and experimental verification with one-dimensional patterns

Masato Shibuya, Akira Takada, Toshiharu Nakashima (2017) Open Access

Video introduction to the journal

Author benefits:

  • Rigorous and prompt peer review (median time from submission to first decision: 36 days)
  • Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
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  • Free online color figures
  • Free inclusion of videos and multimedia 
  • Open access publication option at a low cost
  • 5 free downloads from the SPIE Digital Library for authors
  • Integration with Code Ocean, a cloud-based code development and publishing platform


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